Cleaning of defects is a critical and necessary step in generating a zero-defect mask blank, because defects in the substrate become defects in the multilayer, which ruins the mask blank.

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A great deal of work still remains for getting EUV mask blanks ready for manufacturing, but our cleaning methodology has removed another barrier. We are well positioned for the tasks ahead.

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This achievement is a critical and necessary step in generating a zero-defect mask blank.

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